Method to determine a detection capability of the die-to-database mask inspection system in regard to isolated defects

В статье представлены описание и результаты использования новой методики определения обнаружительной способности установок автоматического контроля оригиналов топологии. Эта методика реализована в установках ЭМ-6029Б и ЭМ-6329, которые осуществляют контроль оригиналов топологии СБИС на фотошаблонах путем сравнения топологии фотошаблона с проектными данными. Методика разработана для проведения испытаний с целью определения способности обнаружения дефектов типа прокол и островок (изолированных дефектов).The paper presents a description and results of the use of a new technique to determine the detection capability of the automatic mask inspection systems. This technique is realized in the EM-6029B and EM-6329 systems, which employ the die-to-database inspection method. The technique is designed to determine the capability to detect such defects as pinholes and pindots (isolated defects)

The movement system for optical mechanical equipment of microelectronics

При производстве элементной базы электронных интегрированных устройств необходимо использовать генераторы формирования планарных структур, таких как установка, производимая концерном ПЛАНАР ЭМ-5109. Для расширения функциональных возможностей генераторов с учетом современных требований по защите информации возникает потребность в использовании новых исполнительных систем пространственного позиционирования объекта обработки, в качестве которых наиболее перспективными являются системы перемещений на трех планарных позиционерах. В работе рассмотрена структура многокоординатной системы перемещений для нужного позиционирования объекта, представлена структура системы управления.The production of microelectronics devices requires usage of planar structures generators, such as apparatus EM-5109 produced by concern PLANAR. For the purposes of functional abilities extension the need of new travel systems of spatial positioning rises, the most perspective are travel systems on three planar positioners. The structure of spatial system for object positioning is described in the work, the structure of control system is described as well

Image stitching algorithm for description of integrated circuit layouts

The problem of optimum matching of partially overlapped frames of an image is formulated with use of common criteria of matching quality. The image stitching algorithm based on key points matching is proposed for quasi-optimal solution of the problem with the following restrictions: the frames are rectangular and have an identical scale. It was implemented as a software module in the system of integrated circuit layout analyses

The Impact of ESD on Microcontrollers

M odern m ethods and means of testing the stability of microcontrollers to the effects of electrostatic discharges are considered. The analysis of functional and operational characteristics of microcontrollers with a program code written in the built-in flash memory is performed. A damage mechanisms classifi­ cation to m icrocontrollers after the influence of electrostatic discharge and the possibility of developing new algorithms for technical diagnostics of microcontrollers are proposed. O n the basis of thermal processes analysis occurring in current-carrying elements of integrated cir­ cuits, the dependence of temperature, electric field strength and power of electromagnetic losses in each element and in their contact areas is shown, depending on the electrostatic discharge voltage. It is shown that electrostatic discharge affects change in programmed data in microcontrollers. The m ethod of functional control of microcontrollers, after exposure to static electricity discharges, developed by the authors is described; this m ethod makes it possible to improve the result of culling of potentially unreliable products by obtaining information about possible violations in the built-in flash memory of microcircuits. The monograph is intended for scientists, engineers, graduate students and undergraduates working in the field of integrated circuits reliability assessment. It can be used by senior courses students of rele­ vant specialties

Autofocus in the systems of automatic mask and wafer pattern inspection

Для повышения точности автоматизированного контроля дефектов топологического рисунка фотошаблонов и полупроводниковых пластин предложена система автофокусировки, обеспечивающая удержание поверхности объекта в зоне резкости объектива при последовательном сканировании топологии.In order to increase accuracy of automatic mask and wafer pattern inspection an autofocus system is offered which ensures keeping the plane in objective focus zone during the sequential scanning of the pattern